Dublin, July 15, 2025 (GLOBE NEWSWIRE) -- The "Magnetron Sputter Film Market Outlook 2025-2034: Market Share, and Growth Analysis By Product Type (Metal Films, Alloy Films, Dielectric Films), By ...

The confocal sputtering technique involves the arrangement of magnetrons inside a vacuum chamber so that it is possible to apply multiple materials onto the substrate without breaking vacuum. This ...

Targets of BaTiO 3 (BT) (50 mm diameter) were prepared starting from BT-commercial powders (99.9%) and particle size of 2 µm, previously dry milled by high energy process (SPEX 8000 mixer mill). The ...

Researchers at University of Tsukuba have developed a technology for real-time estimation of the valence state and growth rate of iron oxide thin films during their formation. This novel technology ...

The state of the target varies with the parameters for the three sputtering modes, and the SMD consists of various voltage-current (V-I) curves at different nitrogen contents and sputtering currents.

The planar magnetron is a typical diode mode sputtering cathode consisting of a permanent magnet array behind it. This magnet array is organized in such a fashion to provide a magnetic field that is ...

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ULVAC is shipping PZT piezoelectric thin-film sputtering equipment which advances the development of MEMS devices. It used to be impossible to fabricate PZT piezoelectric thin films, which constitute ...