A research team, led by Professor Joonki Suh in the Department of Materials Science and Engineering and the Graduate School of Semiconductor Materials and Devices Engineering at UNIST, has made a ...
ISC Konstanz study highlights atomic layer deposition as a superior approach for TOPCon UV stability
Researchers at ISC Konstanz found that ALD-based aluminum oxide (AlOx) passivation layers provide better UV stability for ...
ALD is based on the sequential use of a gas phase chemical process. The ALD cycle consists of four main steps: (1) pulsing of a precursor A, (2) purging of the reactor to remove excess precursor and ...
Layered lithium transition metal oxides with a general formula of LiNi x Mn y Co 1−x−y O 2 (NMC) are important cathode materials for Li-ion batteries due to their high theoretical capacity, energy ...
A research team has made a significant breakthrough in thin film deposition technology. A research team, led by Professor Joonki Suh in the Department of Materials Science and Engineering and the ...
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